Description: Abrasion pads quickly and easily remove stubborn residues from critical process equipment in Semiconductor, LCD, Wafer, MEMS, Optical and Disk Media facilities.
lcd (984) optical (569) semiconductor (429) mems (113) wafer (105) chamber cleaning (2) stainless steel cleaning (2) residue removal (2) critical abrasives (1) disk media (1)
C ONTROLLED E NVIRONMENT D IVISION
Critical Abrasives offers a variety of innovative abrasive pads used in critical environment cleaning applications. Because our products are primarily used in cleanrooms and controlled environments, they are constructed of high quality fiber-free, closed-cell foam and laundered abrasives to ensure minimal particle counts. They also have very low Sodium, Iron, and Magnesium content which is ideal for various clitical environment cleaning applications.
Critical Abrasives has developed innovative products for the Semiconductor, Optical, and Solar Industries ( NuFab Abrasive Pads ) as well as the Pharmaceutical Industry ( NuPharm Abrasive Pads ).